Which is better wet or dry etching?

However, wet etching also requires large amounts of chemicals, is less safe, and offers less control over the etch. Dry etching, on the other hand, offers strong isotropic control, more precision, and is generally safer. Dry etching can also, depending on the process, offer a high etch rate, and it uses less chemicals.

xometry.com - Dry Etching vs. Wet Etching - Differences and Applications

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Wet etching is a technique that uses a liquid solution (usually called an etchant in the liquid phase) to remove layers or portions of a material or part such as a silicon wafer. This process is widely used in semiconductor fabrication in the manufacturing and treatment of wafers. The main advantage of using it is the ability to conduct surface removal on a part-wide scale. Etching intrinsic impurities in the materials (or surface) is especially sought-after and can be provided by etchants in the liquid phase. Applying these etchants causes corrosion in the material, and this corrosion is controlled via masks. Masks are hardened materials that can resist the etching processes, making them perfect for adjusting the angles and shapes of the channels. However, the depth of the etch is controlled by the etch duration and rate while the width of the channel can be reasonably estimated by the mask opening plus twice the channel depth. Some mask materials include gold, titanium, chromium, oxides, and nitrides, depending on which material is subjected to etching (for example, metal or silicon as the etching piece). Generally speaking, in wet etching, engineers use substances such as hydrofluoric acid, nitric acids, phosphoric acids, and hydrochloric acids. The advantages of using these etchants are related to their corrosive properties.

Types of Wet Etching

There are two distinct techniques for wet etching:

The dip method refers to when the part is laid into a tank full of chemical solutions of the type mentioned above. This is considered the ‘classic’ wet etching method - the one that involves a chemical bath. refers to when the part is laid into a tank full of chemical solutions of the type mentioned above. This is considered the ‘classic’ wet etching method - the one that involves a chemical bath. The spin/spray method relies on the etchant being sprayed on the material that’s being processed. At the same time, the part is rotated while being connected to an absorption mechanism. The rotating part of this system is optional, as the erosion of the material is heavily dependent on the crystal planes of the atoms that make up the part subjected to treatment. The second method is more widely used since the dipping technique requires more acidic substances that are toxic to the human body. Silicon wet etching, typically used in semiconductor fabrication, is usually executed using the second method. Correcting another common misconception that may circulate around this process: a wet etching process does not necessarily rely solely on a chemical bath.

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